Crosstalk Effects Caused by Single Event Transient in Deep Submicron Technology
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Abstract
As the process technologies scale down,IC is more susceptible to normal crosstalk and particle radiation with the decreasing of supply voltage and line width. Normal crosstalk and SE induced crosstalk are analyzed on 130nm -40 nm technologies.SE induced crosstalk is more serious than normal crosstalk and is becoming more serious with the scaling down of process. Increasing driver size and space are discussed to determine which one is more efficient for decreasing SE induced crosstalk.
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